IEEE - Institute of Electrical and Electronics Engineers, Inc. - Nanoimprint (Technology, Tools, Applications and Commercialization) And New Technologies Beyond

Microprocesses and Nanotechnology 2007. 20th International Microprocesses and Nanotechnology Conference

Author(s): S.Y. Chou
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 November 2007
Conference Location: Kyoto, Japan
Conference Date: 5 November 2007
Page(s): 4
ISBN (Paper): 978-4-9902472-4-9
DOI: 10.1109/IMNC.2007.4456076
Regular:

Summary form only given. Since the proposal of nanoimprint lithography (NIL) as a low-cost high-throughput sub-10-nm manufacturing method in 1995, the field has been growing rapidly in research,... View More

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