IEEE - Institute of Electrical and Electronics Engineers, Inc. - Ion Beam Analysis of Scalp Hair as a Monitor of Occupational Exposure

Author(s): E. Clayton ; K. K. Wooller
Sponsor(s): IEEE Nuclear and Plasma Sciences Society
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 April 1983
Volume: 30
Page(s): 1,326 - 1,328
ISSN (Paper): 0018-9499
ISSN (Online): 1558-1578
DOI: 10.1109/TNS.1983.4332522
Regular:

Proton Induced X-Ray Emission (PIXE) has been used in trace element analysis of human hair. Samples were charred, mixed with graphite spiked with yttrium (as an internal standard) pressed into... View More

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