IEEE - Institute of Electrical and Electronics Engineers, Inc. - OPC rule management system for SoC

2007 International Symposium on Semiconductor Manufacturing

Author(s): A. Nakajo ; I. Miyazaki ; S. Matsuoka
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 October 2007
Conference Location: Santa Clara, CA, USA
Conference Date: 15 October 2007
Page(s): 1 - 3
ISBN (CD): 978-1-4244-1142-9
ISBN (Paper): 978-1-4244-1141-2
ISSN (Paper): 1523-553X
DOI: 10.1109/ISSM.2007.4446791
Regular:

We have developed a new document management system that aimed at change management of mask layout correction procedure that consists of OPC (Optical Proximity Correction) processing and... View More

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