IEEE - Institute of Electrical and Electronics Engineers, Inc. - Practical anti-microbial surfaces on nylon and polyester by UV photochemistry

2007 Quantum Electronics and Laser Science Conference

Author(s): Michael J. Kelley ; Zhengmao Zhu
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 May 2007
Conference Location: Baltimore, MD, USA, USA
Conference Date: 6 May 2007
Page(s): 1
ISBN (CD): 978-1-55752-834-6
DOI: 10.1109/QELS.2007.4431532
Regular:

Surface radicals generated by 193 nm (nylon) or 172 nm (PET) UV light afford strongly antimicrobial amine functionality by grafting or by transformation. They are broadly effective in the lab and... View More

Advertisement