IEEE - Institute of Electrical and Electronics Engineers, Inc. - Is entanglement dispensable in quantum lithography?

2007 Quantum Electronics and Laser Science Conference

Author(s): Milena D'Angelo ; G. Scarcelli ; Yanhua Shih
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 May 2007
Conference Location: Baltimore, MD, USA, USA
Conference Date: 6 May 2007
Page(s): 1 - 2
ISBN (CD): 978-1-55752-834-6
DOI: 10.1109/QELS.2007.4431244
Regular:

Can classical light simulate the effect of quantum lithography? The analysis of the two-photon image generated both by entangled two-photon and by chaotic radiation indicates that only... View More

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