IEEE - Institute of Electrical and Electronics Engineers, Inc. - New lithography excimer light source technology for ArF (193 nm) semiconductor manufacturing

IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop

Author(s): D.J. Colon, III
Sponsor(s): IEEE Comput. Soc.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2003
Conference Location: Munich, Germany, Germany
Conference Date: 31 March 2003
Page Count: 6
Page(s): 304 - 309
ISBN (Paper): 0-7803-7681-1
ISSN (Paper): 1078-8743
DOI: 10.1109/ASMC.2003.1194512
Regular:

Future argon fluoride (ArF), 193 nm photolithography applications will require excimer light sources to generate very narrow spectral bandwidths at high output power. In order to meet these... View More

Advertisement