IEEE - Institute of Electrical and Electronics Engineers, Inc. - Beam parallelism in the ULVAC IW-630 medium current implanter

Proceedings of the 2002 14th International Conference on Ion Implantation Technology

Author(s): Suzuki, H. ; Niikura, K. ; McLaughlin, T. ; Rhoad, T.
Sponsor(s): IEEE Circuits & Syst. Soc
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2002
Conference Location: Taos, New Mexico, USA, USA
Conference Date: 22 September 2002
Page Count: 3
Page(s): 495 - 497
ISBN (Paper): 0-7803-7155-0
DOI: 10.1109/IIT.2002.1258049
Regular:

Precise control of the ion beam across the entire wafer must be maintained to ensure the incident beam is not aligned to a major crystallographic axis and that ions are not allowed to traverse... View More

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