IEEE - Institute of Electrical and Electronics Engineers, Inc. - Process performance of the ULVAC IW-630 200/300mm implanter

Proceedings of the 2002 14th International Conference on Ion Implantation Technology

Author(s): Rhoad, T. ; Lovelace, B. ; Suzuki, H. ; Niikura, K. ; McLaughlin, T.
Sponsor(s): IEEE Circuits & Syst. Soc
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2002
Conference Location: Taos, New Mexico, USA, USA
Conference Date: 22 September 2002
Page Count: 4
Page(s): 491 - 494
ISBN (Paper): 0-7803-7155-0
DOI: 10.1109/IIT.2002.1258048
Regular:

The process performance for ULVAC's IW-630 200/300 mm medium current ion implanter is reviewed. The IW-630 was designed to ensure high beam parallelism, high-energy purity, and low defect... View More

Advertisement