IEEE - Institute of Electrical and Electronics Engineers, Inc. - Ion implant data log analysis for process control and fault detection

Proceedings of the 2002 14th International Conference on Ion Implantation Technology

Author(s): Rendon, M.J. ; Sing, D.C. ; Beard, M. ; Hartig, M. ; Arnold, J.C.
Sponsor(s): IEEE Circuits & Syst. Soc
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2002
Conference Location: Taos, New Mexico, USA, USA
Conference Date: 22 September 2002
Page Count: 4
Page(s): 331 - 334
ISBN (Paper): 0-7803-7155-0
DOI: 10.1109/IIT.2002.1258007
Regular:

Data mining techniques have been introduced to the semiconductor industry in recent years. In this paper, we report on progress in developing a network based implant data log (IDL) data analysis... View More

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