IEEE - Institute of Electrical and Electronics Engineers, Inc. - Influence of antenna shape and resist patterns on charging damage during ion implantation

Proceedings of the 2002 14th International Conference on Ion Implantation Technology

Author(s): Dirnecker, T. ; Frey, L. ; Bauer, A.J. ; Ryssel, H. ; Ruf, A. ; Henke, D. ; Beyer, A.
Sponsor(s): IEEE Circuits & Syst. Soc
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2002
Conference Location: Taos, New Mexico, USA, USA
Conference Date: 22 September 2002
Page Count: 4
Page(s): 291 - 294
ISBN (Paper): 0-7803-7155-0
DOI: 10.1109/IIT.2002.1257996
Regular:

MOS capacitors with attached poly electrodes (antennas) were designed with various antenna shapes for the evaluation of charging damage during ion implantation. Different resist patterns were... View More

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