IEEE - Institute of Electrical and Electronics Engineers, Inc. - Seamless transferability of doping processes between the VIISta platform of ion implanters

Proceedings of the 2002 14th International Conference on Ion Implantation Technology

Author(s): Variam, N. ; Mehta, S. ; Norasetthekul, S. ; Guo, B.N.
Sponsor(s): IEEE Circuits & Syst. Soc
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2002
Conference Location: Taos, New Mexico, USA, USA
Conference Date: 22 September 2002
Page Count: 4
Page(s): 283 - 286
ISBN (Paper): 0-7803-7155-0
DOI: 10.1109/IIT.2002.1257994
Regular:

The VIISta platform of implanters provides single wafer implantation over the entire energy and dose range for ≤130nm CMOS technology. These implanters feature common hardware and design... View More

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