IEEE - Institute of Electrical and Electronics Engineers, Inc. - Precision halo control with antimony and indium on Axcelis medium current ion implanters

Proceedings of the 2002 14th International Conference on Ion Implantation Technology

Author(s): Luckman, G. ; Harris, M. ; Rathmell, R.D. ; Kopalidis, P. ; Ray, A.M. ; Sato, F. ; Sano, M.
Sponsor(s): IEEE Circuits & Syst. Soc
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2002
Conference Location: Taos, New Mexico, USA, USA
Conference Date: 22 September 2002
Page Count: 4
Page(s): 279 - 282
ISBN (Paper): 0-7803-7155-0
DOI: 10.1109/IIT.2002.1257993
Regular:

Heavy ions such as indium and antimony are increasingly being used for high tilt angle halo implants needed for control of short channel effects in advanced CMOS devices. Precise angular control... View More

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