IEEE - Institute of Electrical and Electronics Engineers, Inc. - Neutral-Beam Technologies for Novel Nanomaterials and Nanodevices: Suppressing the Formation of Defects at the Atomic Layer Level

Author(s): Seiji Samukawa
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 December 2019
Volume: 13
Page(s): 21 - 33
ISSN (Electronic): 1942-7808
ISSN (Paper): 1932-4510
DOI: 10.1109/MNANO.2019.2941034
Regular:

Advances in plasma-process technology have contributed directly to advances in the miniaturization and integration of semiconductor devices. As semiconductor devices reach the nanoscale domain,... View More

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