IEEE - Institute of Electrical and Electronics Engineers, Inc. - Atomic Precision Device Fabrication Using Cyclic Self-Limiting Plasma Processes: Involving Silicon, Silicon Nitride, and Silicon Dioxide

Author(s): Peter L.G. Ventzek ; Toshihiko Iwao ; Alok Ranjan
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 December 2019
Volume: 13
Page(s): 8 - 20
ISSN (Electronic): 1942-7808
ISSN (Paper): 1932-4510
DOI: 10.1109/MNANO.2019.2941035
Regular:

Advanced logic, interconnect, contact, and memory at 5 nm and 3 nm put nearly impossible process requirements on material removal and addition processes. So-called atomic precision fabrication of... View More

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