Optical Society (The) (OSA) - Efficient ablation of silicon with high power GHz femtosecond laser source

2019 Conference on Lasers and Electro-Optics (CLEO)

Author(s): E. Mottay ; G. Bonamis ; K. Mishchik ; J. Lopez ; E. Audouard ; C. Honninger ; I. Manek-Honninger
Publisher: Optical Society (The) (OSA)
Publication Date: 1 May 2019
Conference Location: San Jose, CA, USA, USA
Conference Date: 5 May 2019
Page(s): 1 - 2
ISBN (Electronic): 978-1-943580-57-6
DOI: 10.23919/CLEO.2019.8749257
Regular:

Ablation of silicon using high power GHz femtosecond lasers achieves specific removal rate of 2.5 mm3/min/W. Ablation morphologies are discussed in terms of thermal and non-thermal... View More

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