IEEE - Institute of Electrical and Electronics Engineers, Inc. - Pattern Similarity Metrics for Layout Pattern Classification and Their Validity Analysis by Lithographic Responses

2018 IEEE Computer Society Annual Symposium on VLSI (ISVLSI)

Author(s): Atsushi Takahashi ; Shimpei Sato ; Hiroki Ogura ; Yu-Min Sung ; Ting-Chi Wang
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 July 2018
Conference Location: Hong Kong, China
Conference Date: 8 July 2018
Page(s): 494 - 497
ISBN (Electronic): 978-1-5386-7099-6
ISSN (Electronic): 2159-3477
DOI: 10.1109/ISVLSI.2018.00095
Regular:

In order to detect manufacturing hotspots from huge layout pattern efficiently or to characterize hotspots effectively, various layout pattern classification methods had been proposed. Layout... View More

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