IEEE - Institute of Electrical and Electronics Engineers, Inc. - Interconnects Electrical Parametric Variability Control for Automotive Manufacturing

2019 Electron Devices Technology and Manufacturing Conference (EDTM)

Author(s): Kwang Sing Yew ; Ramasamy Chockalingam ; Choon Gay Lee ; Jasper Goh ; Baozhuo Chen ; Xiaochong Guan ; Rex Hsu ; Juan Boon Tan
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 March 2019
Conference Location: Singapore, Singapore, Singapore
Conference Date: 12 March 2019
Page(s): 294 - 296
ISBN (Electronic): 978-1-5386-6508-4
DOI: 10.1109/EDTM.2019.8731023
Regular:

The control of interconnects resistance, intra- and inter-capacitance (RC) variations in order to meet the stringent automotive sigma requirements is an extremely challenging task in the advanced... View More

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