IEEE - Institute of Electrical and Electronics Engineers, Inc. - Compensating Misalignment Using Dynamic Random-Effect Control System: A Case of High-Mixed Wafer Fabrication

Author(s): Marzieh Khakifirooz ; Chen-Fu Chien ; Mahdi Fathi
Sponsor(s): IEEE Robotics and Automation Society
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Volume: PP
Page(s): 1 - 12
ISSN (Electronic): 1558-3783
ISSN (Paper): 1545-5955
DOI: 10.1109/TASE.2019.2894668
Regular:

It is vital to have an exclusive modification in semiconductor production process because of meeting differentiated customer demands in dynamic and competitive global minuscule semiconductor... View More

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