IEEE - Institute of Electrical and Electronics Engineers, Inc. - From PERC to Tandem: POLO- and p+/n+ Poly-Si Tunneling Junction as Interface Between Bottom and Top Cell

Author(s): Robby Peibst ; Michael Rienacker ; Byungsul Min ; Christina Klamt ; Raphael Niepelt ; Tobias F. Wietler ; Thorsten Dullweber ; Eduard Sauter ; Jens Hubner ; Michael Oestreich ; Rolf Brendel
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2019
Volume: 9
Page(s): 49 - 54
ISSN (Electronic): 2156-3403
ISSN (Paper): 2156-3381
DOI: 10.1109/JPHOTOV.2018.2876999
Regular:

We present a novel cell concept that combines the tandem cell approach with the passivated emitter and rear cells (PERC) mainstream technology. As an interface between Si bottom and top cell, we... View More

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