IEEE - Institute of Electrical and Electronics Engineers, Inc. - High-Aspect Ratio Si Neural Shafts: Fabrication and Brain Implantation

Author(s): S. B. Goncalves ; A. M. Loureiro ; H. C. Fernandes ; S. Pimenta ; J. F. Ribeiro ; J. H. Correia
Sponsor(s): IEEE Electron Devices Society
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 December 2018
Volume: 27
Page(s): 1,097 - 1,104
ISSN (Electronic): 1941-0158
ISSN (Paper): 1057-7157
DOI: 10.1109/JMEMS.2018.2868229
Regular:

This paper presents a simple micromachining process to fabricate 2-D devices consisting of up to 20-mm-long shafts for neural applications. The manufacturing technology was mainly based on... View More

Advertisement