IEEE - Institute of Electrical and Electronics Engineers, Inc. - Real-time Plasma Uniformity Measurement Technique Using Optical Emission Spectroscopy with Revolving Module

Author(s): In Joong Kim ; Ilgu Yun
Sponsor(s): IEEE Sensors Council
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Volume: PP
Page(s): 1
ISSN (CD): 2379-9153
ISSN (Electronic): 1558-1748
ISSN (Paper): 1530-437X
DOI: 10.1109/JSEN.2018.2885349
Regular:

A measurement technique for analyzing real-time plasma abnormality using optical emission spectroscopy (OES) is proposed to detect process uniformity during semiconductor processing. Among many... View More

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