IEEE - Institute of Electrical and Electronics Engineers, Inc. - Automatic extraction methodology for accurate measurement of effective channel length on 65nm MOSFET technology and below

IEEE International Conference on Microelectronic Test Structures, ICMTS 2007

Author(s): D. Fleury ; A. Cros ; K. Romanjek ; D. Roy ; F. Perrier ; B. Dumont ; H. Brut
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 March 2007
Conference Location: Tokyo, Japan
Conference Date: 19 March 2007
Page(s): 89 - 92
ISBN (CD): 1-4244-0781-8
ISBN (Paper): 1-4244-0780-X
DOI: 10.1109/ICMTS.2007.374461
Regular:

Constant downscaling of transistors leads to increase the relative difference between Lmask and Leff. Effective length (Leff) extractions are now crucial to avoid... View More

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