IEEE - Institute of Electrical and Electronics Engineers, Inc. - FUSI Specific Yield Monitoring Enabling Improved Circuit Performance and Fast Feedback to Production

IEEE International Conference on Microelectronic Test Structures, ICMTS 2007

Author(s): T. Chiarella ; M. Rosmeulen ; H. Tigelaar ; C. Kerner ; A. Nackaerts ; J. Ramos ; A. Lauwers ; A. Veloso ; M. Jurczak ; A. Rothschild ; L. Witters ; H. Yu ; J.A. Kittl ; R. Verbeeck ; M. de Potter ; I. Debusschere ; P. Absil ; S. Biesemans ; T. Hoffmann
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 March 2007
Conference Location: Tokyo, Japan
Conference Date: 19 March 2007
Page(s): 33 - 36
ISBN (CD): 1-4244-0781-8
ISBN (Paper): 1-4244-0780-X
DOI: 10.1109/ICMTS.2007.374450
Regular:

The integration of fully silicided gates on a high-k dielectric in a standard process flow offers a solid alternative to the conventional Poly/SiON devices. In this work, we provide an extensive... View More

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