IEEE - Institute of Electrical and Electronics Engineers, Inc. - A New Methodology for Interconnect Parasitics Extraction Considering Photo-Lithography Effects

2007 Asia and South Pacific Design Automation Conference

Author(s): Ying Zhou ; Zhuo Li ; Yuxin Tian ; Weiping Shi ; F. Liu
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2007
Conference Location: Yokohama, Japan
Conference Date: 23 January 2007
Page(s): 450 - 455
ISBN (CD): 1-4244-0630-7
ISBN (Paper): 1-4244-0629-3
DOI: 10.1109/ASPDAC.2007.358027
Regular:

Even with the wide adaptation of resolution enhancement techniques in sub-wavelength lithography, the geometry of the fabricated interconnect is still quite different from the drawn one. Existing... View More

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