IEEE - Institute of Electrical and Electronics Engineers, Inc. - Fast and Accurate OPC for Standard-Cell Layouts

2007 Asia and South Pacific Design Automation Conference

Author(s): D.M. Pawlowski ; Liang Deng ; M.D.F. Wong
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2007
Conference Location: Yokohama, Japan
Conference Date: 23 January 2007
Page(s): 7 - 12
ISBN (CD): 1-4244-0630-7
ISBN (Paper): 1-4244-0629-3
DOI: 10.1109/ASPDAC.2007.357784
Regular:

Model based optical proximity correction (OPC) has become necessary at 90nm technology node and beyond. Cell-wise OPC is an attractive technique to reduce the mask data size as well as the... View More

Advertisement