IEEE - Institute of Electrical and Electronics Engineers, Inc. - Silicon-based nanomembrane materials: the ultimate in strain engineering

2006 Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems

Author(s): Hao-Chih Yuan ; M.M. Roberts ; Pengpeng Zhang ; Byoung-Nam Park ; L.J. Klein ; D.E. Savage ; F.S. Flack ; Zhenqiang Ma ; P.G. Evans ; M.A. Eriksson ; G.K. Celler ; M.G. Lagally
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2006
Conference Location: San Diego, CA, USA
Conference Date: 18 January 2006
Page Count: 7
ISBN (Paper): 0-7803-9472-0
DOI: 10.1109/SMIC.2005.1587986
Regular:

The lattice-mismatch-induced strain in growth of Ge on Si produces a host of exciting scientific and technological consequences, both in 3D nanostructure formation and, when... View More

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