IEEE - Institute of Electrical and Electronics Engineers, Inc. - Exploring the capabilities of immersion lithography

2005 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop

Author(s): C.A. Mack
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2005
Conference Location: Munich, Germany
Conference Date: 11 April 2005
Page Count: 6
Page(s): 58 - 63
ISBN (Paper): 0-7803-8997-2
DOI: 10.1109/ASMC.2005.1438768
Regular:

Immersion lithography has recently emerged as the leading candidate for extending 193 nm lithography to the 45 nm lithography node and beyond. By immersing the wafer in a high index fluid, lens... View More

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