IEEE - Institute of Electrical and Electronics Engineers, Inc. - Novel dielectric materials for future transistor generations

2005 IEEE Workshop on Microelectronics and Electron Devices

Author(s): G. Bersuker
Sponsor(s): IEEE Electron Devices Soc. - Boise Chapter
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2005
Conference Location: Boise, ID, USA
Conference Date: 15 April 2005
Page Count: 1
Page(s): 10
ISBN (Paper): 0-7803-9072-5
DOI: 10.1109/WMED.2005.1431600
Regular:

Summary form only given. To meet the need for higher transistor speed while keeping power consumption under control, the semiconductor industry is working to introduce high-k gate dielectrics in... View More

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