IEEE - Institute of Electrical and Electronics Engineers, Inc. - Matching variation after HCI stress in advanced CMOS technology for analog applications

2005 IEEE International Integrated Reliability Workshop Final Report

Author(s): J.C. Lin ; S.Y. Chen ; H.W. Chen ; H.C. Lin ; Z.W. Jhou ; S. Chou ; J. Ko ; T.F. Lei ; H.S. Haung
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2005
Conference Location: S. Lake Tahoe, CA, USA
Conference Date: 17 October 2005
ISBN (Paper): 0-7803-8992-1
DOI: 10.1109/IRWS.2005.1609575
Regular:

In this report, hot carrier stress impact on mismatch properties of n and p MOS transistors with different sizes produced using 0.15 /spl mu/m CMOS technology is presented for the first time. The... View More

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