IEEE - Institute of Electrical and Electronics Engineers, Inc. - Fluorinated ALD Al/sub 2/O/sub 3/ Gate Dielectrics by CF/sub 4/ Plasma

2005 International Semiconductor Device Research Symposium

Author(s): Chao Sung Lai ; Kung Ming Fan ; Yi Jung Chen ; Kuo Hui Su ; Chang Rong Wu ; Shian Jyh Lin ; Chung-Yuan Lee
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2005
Conference Location: Bethesda, MD, USA
Conference Date: 7 December 2005
Page Count: 2
Page(s): 266 - 267
ISBN (Paper): 1-4244-0083-X
DOI: 10.1109/ISDRS.2005.1596087
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