IEEE - Institute of Electrical and Electronics Engineers, Inc. - Full 3D Process and Device Simulation for FinFET optimization

2005 International Semiconductor Device Research Symposium

Author(s): M. Nawaz ; P. Haibach ; E. Landgraf ; W. Rosner ; M. Stadele ; R.J. Luyken ; A. Gencer
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2005
Conference Location: Bethesda, MD, USA
Conference Date: 7 December 2005
Page Count: 2
Page(s): 40 - 41
ISBN (Paper): 1-4244-0083-X
DOI: 10.1109/ISDRS.2005.1595966
Advertisement