IEEE - Institute of Electrical and Electronics Engineers, Inc. - New developments in S-FIL technology

Digest of Papers Microprocesses and Nanotechnology 2005. 2005 International Microprocesses and Nanotechnology Conference

Author(s): M.P.C. Watts ; M. Miller ; N. Stacey ; J. Choi ; M. Subramanian ; P. Schumaker ; I. McMackin ; Jin Choi ; D. Resnick ; S.V. Sreenivasan ; M. Falcon
Sponsor(s): Japan Soc. of Appl. Phys
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2005
Conference Location: Tokyo, Japan, Japan
Conference Date: 25 October 2005
Page(s): 258 - 259
ISBN (Paper): 4-9902472-2-1
DOI: 10.1109/IMNC.2005.203836
Regular:

The Step and Flash/spl trade/ Imprint Lithography (S-FIL/spl trade/) process has been developed around a low viscosity, UV curable monomer that allows processing at pressures of < 0.5psi and... View More

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