IEEE - Institute of Electrical and Electronics Engineers, Inc. - E-beam data preparation method for forming ultra fine curved patterns in silicon microphotonic circuit

Digest of Papers Microprocesses and Nanotechnology 2005. 2005 International Microprocesses and Nanotechnology Conference

Author(s): T. Watanabe ; T. Tsuchizawa ; K. Yamada ; H. Fukuda ; S. Itabashi
Sponsor(s): Japan Soc. of Appl. Phys
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2005
Conference Location: Tokyo, Japan, Japan
Conference Date: 25 October 2005
Page(s): 240 - 241
ISBN (Paper): 4-9902472-2-1
DOI: 10.1109/IMNC.2005.203827
Regular:

We have developed a data preparation method for e-beam writers that improved their ability to fabricate ultra fine curved patterns.

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