IEEE - Institute of Electrical and Electronics Engineers, Inc. - Optimization of sub-wavelength texturing structures in solar cells by utilizing modified illumination and defocus techniques in optical lithography

Digest of Papers Microprocesses and Nanotechnology 2005. 2005 International Microprocesses and Nanotechnology Conference

Author(s): H.L. Chen ; Wonder Fan ; K.T. Huang ; C.H. Lin ; K.C. Hsieh
Sponsor(s): Japan Soc. of Appl. Phys
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2005
Conference Location: Tokyo, Japan, Japan
Conference Date: 25 October 2005
Page(s): 230 - 231
ISBN (Paper): 4-9902472-2-1
DOI: 10.1109/IMNC.2005.203822
Regular:

In this paper, we demonstrate a simple method, combining conventional optical lithography and reactive ion etching (RIE) processes to fabricate an optimized pyramid structure by tuning the... View More

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