IEEE - Institute of Electrical and Electronics Engineers, Inc. - Development of simultaneous image acquisition optics with transmitted and reflected light for 45nm (hp) node mask inspection

Digest of Papers Microprocesses and Nanotechnology 2005. 2005 International Microprocesses and Nanotechnology Conference

Author(s): R. Hirano ; K. Yamashita ; K. Ohira ; K. Matsuki ; J. Isomura ; R. Ogawa ; N. Kikuiri ; T. Terasawa
Sponsor(s): Japan Soc. of Appl. Phys
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2005
Conference Location: Tokyo, Japan, Japan
Conference Date: 25 October 2005
Page(s): 224 - 225
ISBN (Paper): 4-9902472-2-1
DOI: 10.1109/IMNC.2005.203819
Regular:

A novel high-resolution mask inspection platform using DUV wavelength has been reported. It is operated at inspection wavelength of 198.5 nm. The wavelength is nearly equal to the exposure... View More

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