IEEE - Institute of Electrical and Electronics Engineers, Inc. - Electronic and structural characteristics of atomic diffusion in Fe/Al [001] and Al/Fe [001] systems

Digest of Papers Microprocesses and Nanotechnology 2005. 2005 International Microprocesses and Nanotechnology Conference

Author(s): Chiho Kim ; Yong-Chae Chung
Sponsor(s): Japan Soc. of Appl. Phys
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2005
Conference Location: Tokyo, Japan, Japan
Conference Date: 25 October 2005
Page(s): 190 - 191
ISBN (Paper): 4-9902472-2-1
DOI: 10.1109/IMNC.2005.203802
Regular:

In this study, the atomistic behaviors of surface diffusion and incorporation in Fe-Al multilayer systems were quantitatively investigated using density functional theory (DFT) calculation. The... View More

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