IEEE - Institute of Electrical and Electronics Engineers, Inc. - Development of nm resolution focus detector in vacuum for EUVM

Digest of Papers Microprocesses and Nanotechnology 2005. 2005 International Microprocesses and Nanotechnology Conference

Author(s): Y. Tanaka ; K. Hamamoto ; T. Watanabe ; H. Kinoshita
Sponsor(s): Japan Soc. of Appl. Phys
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2005
Conference Location: Tokyo, Japan, Japan
Conference Date: 25 October 2005
Page(s): 102 - 103
ISBN (Paper): 4-9902472-2-1
DOI: 10.1109/IMNC.2005.203758
Regular:

Since the numerical aperture of the optical system of the EUV microscope for mask inspection is as large as 0.3, the depth of focus becomes server within 100 nm. For this reason, the focus... View More

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