IEEE - Institute of Electrical and Electronics Engineers, Inc. - Sensitivity-limiting factors of at-wavelength EUVL mask blank inspection

Digest of Papers Microprocesses and Nanotechnology 2005. 2005 International Microprocesses and Nanotechnology Conference

Author(s): Y. Tezuka ; T. Tanaka ; T. Terasawa ; T. Tomie
Sponsor(s): Japan Soc. of Appl. Phys
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2005
Conference Location: Tokyo, Japan, Japan
Conference Date: 25 October 2005
Page(s): 80 - 81
ISBN (Paper): 4-9902472-2-1
DOI: 10.1109/IMNC.2005.203747
Regular:

Extreme ultraviolet lithography (EUVL) is one of the promising candidates among several lithography options for hp45nm node and beyond. However, fabrication and qualification of defect-free... View More

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