IEEE - Institute of Electrical and Electronics Engineers, Inc. - Defect control of immersion lithography with top coat material

Digest of Papers Microprocesses and Nanotechnology 2005. 2005 International Microprocesses and Nanotechnology Conference

Author(s): T. Ando ; T. Takayama ; H. Tsuji ; K. Ishizuka ; M. Yoshida ; T. Hirano ; J. Yokoya ; K. Ohmori
Sponsor(s): Japan Soc. of Appl. Phys
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2005
Conference Location: Tokyo, Japan, Japan
Conference Date: 25 October 2005
Page(s): 54 - 55
ISBN (Paper): 4-9902472-2-1
DOI: 10.1109/IMNC.2005.203734
Regular:

193nm immersion lithography is the most promising lithography candidate toward 45nm node technology and beyond; because it is able to obtain larger DOF and higher resolution at a hyper NA lens... View More

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