IEEE - Institute of Electrical and Electronics Engineers, Inc. - Hyper-NA imaging in ArF immersion lithography

Digest of Papers Microprocesses and Nanotechnology 2005. 2005 International Microprocesses and Nanotechnology Conference

Author(s): T. Honda ; M. Kawashima ; Y. Sekine ; K. Yamazoe ; E. Sakamoto
Sponsor(s): Japan Soc. of Appl. Phys
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2005
Conference Location: Tokyo, Japan, Japan
Conference Date: 25 October 2005
Page(s): 10 - 11
ISBN (Paper): 4-9902472-2-1
DOI: 10.1109/IMNC.2005.203712
Regular:

ArF immersion lithography (Lin, 2004) has emerged as the primary solution for the manufacturing of semiconductor device for 65-nm half-pitch node and beyond. The immersion technique allows the... View More

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