IEEE - Institute of Electrical and Electronics Engineers, Inc. - Fabrication of single-electron tunneling devices

Proceedings of 20th Biennial Conference on Precision Electromagnetic Measurements

Author(s): Yoo, K.-H. ; Park, J.C. ; Park, J.W. ; Choi, J.B.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1996
Conference Location: Braunschweig, Germany, Germany
Conference Date: 17 June 1996
Page(s): 263 - 264
ISBN (Paper): 0-7803-3376-4
DOI: 10.1109/CPEM.1996.547063
Regular:

We have fabricated very small Al/AlO/sub x//Al junctions connected in series using electron-beam lithography and double-angle evaporation techniques. The average junction area is obtained to be... View More

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