IEEE - Institute of Electrical and Electronics Engineers, Inc. - Diagnostics of positive and negative ions in high-density CF/sub 4/ plasmas by time-of-flight mass spectrometry

IEEE Conference Record - Abstracts. 1996 IEEE International Conference on Plasma Science

Author(s): Sasaki, K. ; Ura, K. ; Kadota, K.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1996
Conference Location: Boston, MA, USA, USA
Conference Date: 3 June 1996
ISBN (Paper): 0-7803-3322-5
ISSN (Paper): 0730-9244
DOI: 10.1109/PLASMA.1996.550729
Regular:

Summary form only given. High-density plasmas employing carbon-tetrafluoride (CF/sub 4/) gas have widely been used for etching processes of SiO/sub 2//Si in the fabrication of... View More

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