IEEE - Institute of Electrical and Electronics Engineers, Inc. - Adaption of a microwave plasma source for low temperature diamond deposition

IEEE Conference Record - Abstracts. 1996 IEEE International Conference on Plasma Science

Author(s): Ulczynski, M. ; Reinhard, D.K. ; Asmussen, J.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1996
Conference Location: Boston, MA, USA, USA
Conference Date: 3 June 1996
ISBN (Paper): 0-7803-3322-5
ISSN (Paper): 0730-9244
DOI: 10.1109/PLASMA.1996.550641
Regular:

Summary form only given. This report describes the adaption of a microwave plasma reactor for low temperature diamond deposition. The reactor is of a resonant cavity design. Three approaches have... View More

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