IEEE - Institute of Electrical and Electronics Engineers, Inc. - Chlorine containing hydrogenated amorphous silicon without optical band gap widening

3rd World Conference on Photovoltaic Energy Conversion

Author(s): A. Takano ; T. Wada ; S. Fujikake ; T. Yoshida ; T. Ohto ; E.S. Aydil
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2003
Conference Location: Osaka, Japan
Conference Date: 11 May 2003
Volume: 2
Page Count: 4
ISBN (Paper): 4-9901816-0-3
Regular:

Chlorine containing hydrogenated amorphous silicon films were deposited by adding HCl to SiH/sub 4/ containing plasmas. Bulk and surface bonding features, film thickness and optical band gap were... View More

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