IEEE - Institute of Electrical and Electronics Engineers, Inc. - An effective SPC approach to monitoring semiconductor quality data with multiple variation sources

2000 Semiconductor Manufacturing Technology Workshop

Author(s): Argon Chen ; Ruey-Shan Guo ; Pei-Chen Yeh
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Hsinchu, Taiwan, Taiwan
Conference Date: 14 June 2000
Page(s): 279 - 282
ISBN (Paper): 0-7803-6374-4
DOI: 10.1109/SMTW.2000.883106
Regular:

In semiconductor manufacturing, post-process metrology and statistical monitoring of quality data are critical to ensure a high yield and good quality products. Effective SPC charting can detect... View More

Advertisement