IEEE - Institute of Electrical and Electronics Engineers, Inc. - SHEWMAC: an end-of-line SPC scheme via exponentially weighted moving statistics

2000 Semiconductor Manufacturing Technology Workshop

Author(s): Chih-Min Fan ; Shi-Chung Chang ; Ruey-Shan Guo ; Hui-Hung Kung ; Jyh-Cheng You ; Hsin-Pai Chen ; Lin, S. ; Chih-Shih Wei
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Hsinchu, Taiwan, Taiwan
Conference Date: 14 June 2000
Page(s): 268 - 278
ISBN (Paper): 0-7803-6374-4
DOI: 10.1109/SMTW.2000.883105
Regular:

Due to the multiple-stream and sequence-disorder effects, a process change caused by one machine at an in-line step may result in changes in both the mean and variance of end-of-line wafer... View More

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