IEEE - Institute of Electrical and Electronics Engineers, Inc. - New self-aligned micromachining process for large free-space optical cross-connects

2000 IEEE/LEOS International Conference on Optical MEMS

Author(s): Helin, P. ; Bourouina, T. ; Mita, M. ; Reyne, G. ; Fujita, H.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Kauai, HI, USA, USA
Conference Date: 1 August 2000
Page(s): 119 - 120
ISBN (Paper): 0-7803-6257-8
DOI: 10.1109/OMEMS.2000.879655
Regular:

An improved self-aligned micromachining process for large-scale free-space optical cross-connect is presented. It satisfies the high accuracy optical alignment required for such application. This... View More

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