IEEE - Institute of Electrical and Electronics Engineers, Inc. - LPCVD polysilicon films with controlled curvature for optical MEMS: the MultiPoly/sup TM/ process

2000 IEEE/LEOS International Conference on Optical MEMS

Author(s): Heuer, A.H.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Kauai, HI, USA, USA
Conference Date: 1 August 2000
Page(s): 117 - 118
ISBN (Paper): 0-7803-6257-8
DOI: 10.1109/OMEMS.2000.879654
Regular:

A new technique is presented for producing polysilicon films with predetermined stress profiles. Polysilicon films deposited by LPCVD exhibit tensile or compressive residual stresses, depending on... View More

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