IEEE - Institute of Electrical and Electronics Engineers, Inc. - The sheath around biased objects immersed in streaming vacuum arc plasmas

Proceedings of 19th International Symposium on Discharge and Electrical Insulation in Vacuum

Author(s): Anders, A.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Xi'an, China
Conference Date: 18 September 2000
Volume: 2
ISBN (Paper): 0-7803-5791-4
DOI: 10.1109/DEIV.2000.879059
Regular:

Sheaths around negatively biased substrates immersed in vacuum arc plasmas were investigated using positively biased probes. Due to the high plasma density and velocity, the sheath is very thin at... View More

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