IEEE - Institute of Electrical and Electronics Engineers, Inc. - Plasma-chemical reactor with low ion energy for selective etching

2000 10th International Crimean Microwave Conference. Microwave and Telecommunication Technology. Conference Proceedings

Author(s): Ustalov, V.V. ; Fedorovich, O.A. ; Vdovenkov, A.A. ; Levitskaja, S.K.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2000
Conference Location: Crimea, Ukraine, Ukraine
Conference Date: 11 September 2000
Page(s): 434 - 435
ISBN (Paper): 966-572-048-1
DOI: 10.1109/CRMICO.2000.1256171
Regular:

The results of physical and technological tests of the modernized plasma-chemical reactor are presented. The chemically active ion's energy may be controlled by the magnetic field intensity in the... View More

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